H. Fujii et al., Characterization of electrical conduction in silicon nanowire by scanning Maxwell-stress microscopy, APPL PHYS L, 78(17), 2001, pp. 2560-2562
An experimental approach to investigate anomalous electrical conduction in
a 100 nm width silicon wire by scanning Maxwell-stress microscopy (SMM) has
been reported. The silicon wire exhibited negative resistance and hysteres
is characteristics by sweeping the applied voltage up to 50 V. Potential pr
ofile along the wire obtained from the SMM images exhibited that lateral el
ectric field significantly increased at the ground-side end of the wire aft
er the hysteresis characteristics emerged. The field increase is interprete
d as the conductivity decrease. The origin of the conductance decrease is c
onsidered to be generation and trapping of hot holes at the ground-side end
. (C) 2001 American Institute of Physics.