Characterization of electrical conduction in silicon nanowire by scanning Maxwell-stress microscopy

Citation
H. Fujii et al., Characterization of electrical conduction in silicon nanowire by scanning Maxwell-stress microscopy, APPL PHYS L, 78(17), 2001, pp. 2560-2562
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
17
Year of publication
2001
Pages
2560 - 2562
Database
ISI
SICI code
0003-6951(20010423)78:17<2560:COECIS>2.0.ZU;2-0
Abstract
An experimental approach to investigate anomalous electrical conduction in a 100 nm width silicon wire by scanning Maxwell-stress microscopy (SMM) has been reported. The silicon wire exhibited negative resistance and hysteres is characteristics by sweeping the applied voltage up to 50 V. Potential pr ofile along the wire obtained from the SMM images exhibited that lateral el ectric field significantly increased at the ground-side end of the wire aft er the hysteresis characteristics emerged. The field increase is interprete d as the conductivity decrease. The origin of the conductance decrease is c onsidered to be generation and trapping of hot holes at the ground-side end . (C) 2001 American Institute of Physics.