Hexagonal growth spirals on GaN grown by molecular-beam epitaxy: Kinetics versus thermodynamics

Citation
A. Parkhomovsky et al., Hexagonal growth spirals on GaN grown by molecular-beam epitaxy: Kinetics versus thermodynamics, APPL PHYS L, 78(16), 2001, pp. 2315-2317
Citations number
14
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
16
Year of publication
2001
Pages
2315 - 2317
Database
ISI
SICI code
0003-6951(20010415)78:16<2315:HGSOGG>2.0.ZU;2-H
Abstract
GaN grown by molecular-beam epitaxy on Ga-polar GaN templates prepared by m etal organic chemical vapor deposition shows a variety of morphologies that depend on defects and growth conditions. We measured the mean terrace widt hs of hexagonal growth spirals or hillocks versus ammonia and Ga fluxes and substrate temperature. The measurements were compared to a near equilibriu m model of the growth. The results indicate that under excess Ga growth con ditions, Ga-polar GaN(0001) has a mean step-edge energy of 0.27 eV/Angstrom . (C) 2001 American Institute of Physics.