Mechanisms for O-2 dissociation during pulsed-laser ablation and deposition

Citation
A. Camposeo et al., Mechanisms for O-2 dissociation during pulsed-laser ablation and deposition, APPL PHYS L, 78(16), 2001, pp. 2402-2404
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
16
Year of publication
2001
Pages
2402 - 2404
Database
ISI
SICI code
0003-6951(20010415)78:16<2402:MFODDP>2.0.ZU;2-X
Abstract
We investigate different dissociation mechanisms for O-2 gas during pulsed- laser ablation and deposition. Mesaurements are carried out by using an in situ diagnostics based on absorption spectroscopy of oxygen gas, with space - and time-resolved capabilities, during laser ablation of a metal alloy ta rget in the presence of an oxygen environment. Data, analyzed as a function of ablation parameters, indicate that two different mechanisms, involving electron collisions and formation of a high-density, high-temperature shock layer, play an important role in producing atomic oxygen which can subsequ ently react with the ablated species. (C) 2001 American Institute of Physic s.