Study of thermal oxidation of NiO on pure Ni, Ni-10%Cr and Ni-9%V tapes

Citation
Z. Lockman et al., Study of thermal oxidation of NiO on pure Ni, Ni-10%Cr and Ni-9%V tapes, IEEE APPL S, 11(1), 2001, pp. 3325-3328
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
11
Issue
1
Year of publication
2001
Part
3
Pages
3325 - 3328
Database
ISI
SICI code
1051-8223(200103)11:1<3325:SOTOON>2.0.ZU;2-I
Abstract
In this work, the thermal oxidation of NiO has been studied at different an nealing temperatures and oxygen partial pressure. The oxidation properties of Rolling Biaxial Textured substrate (RABiTS) of pure Ni, Ni-9%V and Ni-10 %Cr have been investigated. Oxidation of the substrates either as rolled an d recrystallised or as rolled, recrystallised and chemically etched states have been studied. It is found that etched pure Ni forms cube-textured NiO upon oxidation in oxygen flow while Ni-10%Cr and Ni-9%V developed cube text ured NiO when oxidised in reduced oxygen partial pressure.