High-current Y-Ba-Cu-O coated conductor using metal organic chemical-vapordeposition and ion-beam-assisted deposition

Authors
Selvamanickam, V Carota, G Funk, M Vo, N Haldar, P Balachandran, U Chudzik, M Arendt, P Groves, JR DePaula, R Newnam, B
Citation
V. Selvamanickam et al., High-current Y-Ba-Cu-O coated conductor using metal organic chemical-vapordeposition and ion-beam-assisted deposition, IEEE APPL S, 11(1), 2001, pp. 3379-3381
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
11
Issue
1
Year of publication
2001
Part
3
Pages
3379 - 3381
Database
ISI
SICI code
1051-8223(200103)11:1<3379:HYCCUM>2.0.ZU;2-U
Abstract
YBa2Cu2Ox (YBCO) films have been deposited on buffered metal substrates by metal organic chemical-vapor deposition (MOCVD), Nickel alloy substrates wi th biaxially-textured yttria-stabilized zirconia (YSZ) buffer layers deposi ted by ion-beam-assisted deposition (IBAD) were used. A liquid-static precu rsor delivery system was designed, constructed, and used in the MOCVD facil ity at Intermagnetics for the reported work, At 77 K, under self-field cond itions, we achieved a critical current (I-c) of 97.5 A In YBCO film grown b y MOCVD on an IBAD substrate. This I-c corresponds to a critical current de nsity of 1.3 MA/cm(2) and 130 A/cm width of tape.