Small area Y-Ba-Cu-O thin films for applications in hot-electron bolometers

Authors
Citation
Lr. Vale et Rh. Ono, Small area Y-Ba-Cu-O thin films for applications in hot-electron bolometers, IEEE APPL S, 11(1), 2001, pp. 762-765
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
11
Issue
1
Year of publication
2001
Part
1
Pages
762 - 765
Database
ISI
SICI code
1051-8223(200103)11:1<762:SAYTFF>2.0.ZU;2-W
Abstract
We are investigating the use of very thin, small area YBa2Cu3O7-x (YBCO) fi lms on Si substrates for application in hot-electron bolometers. Hot-electr on bolometers produced from high-T-C materials will be favored over their l ow-temperature counterparts in applications of radio astronomy and atmosphe ric physics where the higher operating temperatures provide distinct advant ages. Devices on Si can help advance this technology for bolometric space a pplications, where a substrate is needed with good thermal conductance and excellent IR performance, Based on our experience with YBCO bolometers and YBCO film growth on Si, we have begun a study of sub-micrometer scale devic es. Our typical YBCO films grown on Si by pulsed laser deposition have crit ical temperatures of 86 K and critical currents of 1-3 x10(6) A/cm(2) at 77 K for YBCO microbridges 45 nm thick, We have made 1-2 mum wide microbridge s from YBCO films of 25 nm to 45 nm thick. These microbridges show reduced critical temperatures of 71 K to 81 K, respectively, related to the process ing sequence that produces the microbridges.