Study on fabrication conditions of the interface-treated trilayer junctions

Citation
M. Maruyama et al., Study on fabrication conditions of the interface-treated trilayer junctions, IEEE APPL S, 11(1), 2001, pp. 788-790
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
11
Issue
1
Year of publication
2001
Part
1
Pages
788 - 790
Database
ISI
SICI code
1051-8223(200103)11:1<788:SOFCOT>2.0.ZU;2-Y
Abstract
We have investigated the effects of fabrication conditions on the propertie s of the interface-treated trilayer Josephson junctions. In the junctions, barriers are formed by ion milling, followed by annealing. We controlled th e accelerating voltage for the milling process and the gas pressure for the annealing process, Josephson currents were observed in the junctions fabri cated under various conditions. It was found that higher accelerating volta ge contributes to the reduction of leakage paths in the barriers. However, clear dependence of the Josephson currents on the conditions was not observ ed in contrast to the results for the ramp-edge junctions.