Physics of high-j(c) Nb/AlOx/Nb Josephson junctions and prospects of theirapplications

Citation
Y. Naveh et al., Physics of high-j(c) Nb/AlOx/Nb Josephson junctions and prospects of theirapplications, IEEE APPL S, 11(1), 2001, pp. 1056-1060
Citations number
39
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY
ISSN journal
10518223 → ACNP
Volume
11
Issue
1
Year of publication
2001
Part
1
Pages
1056 - 1060
Database
ISI
SICI code
1051-8223(200103)11:1<1056:POHNJJ>2.0.ZU;2-F
Abstract
At critical current density of the order of 100 kA/cm(2), tunnel Josephson junctions become overdamped and may be used in RSFQ circuits without extern al shunting, dramatically increasing circuit density. However, the physics of electron transport in such high-j(c) junctions differs from the usual di rect tunneling and until recently remained unclear. We have found that the observed de I-V curves of niobium-trilayer junctions with j(c) = 210 kA/cm( 2) can be explained quantitatively by resonant tunneling through strongly d isordered barriers. According to this interpretation, random spread of crit ical current in high-j(c) junctions may be rather small (below 1% r.m.s.) e ven in deep-submicron junctions, making VLSI RSFQ circuits, with density ab ove 10 MJJ/cm(2), feasible.