Gz. Ran et al., Enhancing electroluminescence from Au/nanoscale Si-rich SiO2 film/p-Si by doping Al into the SiO2 film and gamma-ray irradiation, J LUMINESC, 93(1), 2001, pp. 75-80
Doping Al into the nanoscale Si-rich SiO2 (NSS) films subsequently annealed
at temperatures lower than similar to 700 degreesC made the EL intensity o
f Au/NSS/p-Si samples increase by a factor of 4-6, but did not change its E
L peak wavelength. Doping Al into NSS films subsequently annealed at temper
atures higher than similar to 700 degreesC made the EL intensities of Au/NS
S/p-Si samples increase by a factor larger than 6 and the EL peaks redshift
evidently, gamma -ray irradiation has very similar effects in increasing a
nd redshifting the EL spectra of Au/NSS/p-Si. The currents of Au/NSS/p-Si s
amples with NSS/p-Si annealed at various temperatures under a definite forw
ard bias were invariant or increased in the gamma ray irradiation process.
However, the currents of Au/NSS:Al/p-Si samples with NSS:Al/p-Si annealed a
t temperatures smaller than similar to 700 degreesC under the same definite
forward bias decreased in the gamma -ray irradiation process. The experime
ntal facts can be interpreted qualitatively if the main origin of EL is att
ributed to defects and/or impurities in the NSS films. (C) 2001 Elsevier Sc
ience B.V. All rights reserved.