About the possible diminution of the sp(3) C presence along with the increase of the nitrogen enclosure in the CNx thin films produced by reactive pulsed laser deposition

Citation
E. Gyorgy et al., About the possible diminution of the sp(3) C presence along with the increase of the nitrogen enclosure in the CNx thin films produced by reactive pulsed laser deposition, J MATER SCI, 36(8), 2001, pp. 1951-1956
Citations number
37
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE
ISSN journal
00222461 → ACNP
Volume
36
Issue
8
Year of publication
2001
Pages
1951 - 1956
Database
ISI
SICI code
0022-2461(200104)36:8<1951:ATPDOT>2.0.ZU;2-9
Abstract
We report herewith new experimental data concerning the synthesis of carbon -nitride thin films by reactive pulsed laser deposition (lambda = 248 nm, t au (FWHM) less than or equal to 30 ns) from a graphite target in low pressu re nitrogen (0.2, 1 and 50 Pa) at a level of the incident laser fluence of 22 J/cm(2). The obtained structures were studied by Raman spectrometry and microhardness determinations. We have observed that an increase of the N-2 pressure leads to an increase in the N-2 content in the deposited films but causes the reduction of the amount of the sp(3) bounded C and the decrease of the microhardness of the obtained structures. (C) 2001 Kluwer Academic Publishers.