The effect of CF4 and CHF3 gas on the etching characteristics of Er-doped glass

Authors
Park, KH Lee, S Kwon, KH Moon, JH
Citation
Kh. Park et al., The effect of CF4 and CHF3 gas on the etching characteristics of Er-doped glass, J MAT SCI L, 20(6), 2001, pp. 565-568
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
20
Issue
6
Year of publication
2001
Pages
565 - 568
Database
ISI
SICI code
0261-8028(200103)20:6<565:TEOCAC>2.0.ZU;2-3