Internal stress and adhesive strength of reactive magnetron sputtered indium tin oxide films on acrylics

Citation
Df. Lii et al., Internal stress and adhesive strength of reactive magnetron sputtered indium tin oxide films on acrylics, J CERAM S J, 109(1), 2001, pp. 9-11
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN
ISSN journal
09145400 → ACNP
Volume
109
Issue
1
Year of publication
2001
Pages
9 - 11
Database
ISI
SICI code
0914-5400(200101)109:1<9:ISAASO>2.0.ZU;2-N
Abstract
Indium tin oxide (ITO) films were deposited on acrylics by low temperature reactive magnetron sputtering. The effects of oxygen flow and film thicknes s on the internal stress and adhesion of ITO films on acrylics were evaluat ed. Results from the measurement of lattice parameters suggested that the i nternal compressive stress parallel to the film surface increased with incr easing oxygen flow rate. This was possibly due to the peening effects of bo mbarding particles and the decrease in oxygen vacancies at relatively high oxygen flow. Observation of scratched surface after adhesion test showed th at tensile bending moments occur within the coating as it was pushed down u nderneath the adhesion test indenter. The critical scratching load of ITO f ilms invariably increased with oxygen flow and decreased with increasing th ickness.