Basic constraints for a multibeam lithography column

A 50 keV multibeam test bed incorporating a photocathode and multiple modul ated light beams has been developed and constructed. The column allows for a detailed evaluation of both the photocathode sources and the electron opt ics for sub-100 nm lithography applications and is designed to reduce elect ron-electron (e-e) interactions. The basic constraints determining the perf ormance of the multibeam electron column are discussed. Results have been o btained using gold photocathodes at beam energies varying from 10 to 50 kV, allowing the experimental evaluation of key design parameters. (C) 2001 Am erican Vacuum Society.