Imprinted electrically conductive patterns from a polyaniline blend

Imprinting three-dimensional patterns directly into electrically conductive polymer blends is investigated. Silicon substrates are spin-coated by a po lymethylmethacrylate/polyaniline-camphor sulfonic acid mixture dissolved in m-cresol. The patterns are imprinted using a silicon stamp having a 500 nm deep grating with 5 mum wide lines and spaces. The imprinting temperature was 140 degreesC, pressure 150 bar, and time 10 min. The conductivity of th e blend was 1 S/cm prior to imprinting and decreased by a factor of about 2 in the process. Removing the residual film from the grooves by etching in argon/oxygen plasma results in resistance anisotropy larger than 10(4) perp endicular and parallel to the imprinted polymer ridges. (C) 2001 American V acuum Society.