Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings

Citation
J. Ferre-borrull et al., Procedure to characterize microroughness of optical thin films: application to ion-beam-sputtered vacuum-ultraviolet coatings, APPL OPTICS, 40(13), 2001, pp. 2190-2199
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
APPLIED OPTICS
ISSN journal
00036935 → ACNP
Volume
40
Issue
13
Year of publication
2001
Pages
2190 - 2199
Database
ISI
SICI code
0003-6935(20010501)40:13<2190:PTCMOO>2.0.ZU;2-I
Abstract
A method for characterizing the microroughness of samples in optical coatin g technology is developed. Measurements over different spatial-frequency ra nges are composed into a single power spectral density (PSD) covering a lar ge bandwidth. This is followed by the extraction of characteristic paramete rs through fitting of the PSD to a suitable combination of theoretical mode ls. The method allows us to combine microroughness measurements performed w ith different techniques, and the fitting procedure can be adapted to any b ehavior of a combined PSD. The method has been applied to a set of ion-beam -sputtered fluoride vacuum-UV coatings with increasing number of alternativ e low- and high-index layers. Conclusions about roughness development and m icrostructural growth are drawn. (C) 2001 Optical Society of America.