Compression of the dc drain current by electron trapping in AlGaN/GaN modulation doped field-effect transistors

Citation
S. Nozaki et al., Compression of the dc drain current by electron trapping in AlGaN/GaN modulation doped field-effect transistors, APPL PHYS L, 78(19), 2001, pp. 2896-2898
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
19
Year of publication
2001
Pages
2896 - 2898
Database
ISI
SICI code
0003-6951(20010507)78:19<2896:COTDDC>2.0.ZU;2-Z
Abstract
The frequently observed dc drain current compression of AlGaN/GaN modulatio n doped field-effect transistors is associated with partial loss of the two -dimensional electron gas caused by electron trapping. The behavior of the temperature-dependent electron concentration and persistent photoconductivi ty at low temperature in the AlGaN/GaN modulation doped heterostructure are indicative of the presence of DX centers in the AlGaN layer. Deep-level tr ansient spectroscopy of the drain current reveals carrier trapping with act ivation energy of 0.28 eV. However, this value appears to be too small to e xplain the compression of the dc drain current or to attribute these traps to DX centers in AlGaN. (C) 2001 American Institute of Physics.