Shear-mode scanning capacitance microscope

Citation
Y. Naitou et N. Ookubo, Shear-mode scanning capacitance microscope, APPL PHYS L, 78(19), 2001, pp. 2955-2957
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
19
Year of publication
2001
Pages
2955 - 2957
Database
ISI
SICI code
0003-6951(20010507)78:19<2955:SSCM>2.0.ZU;2-L
Abstract
Scanning capacitance microscope (SCM) is developed using an all-metallic pr obe, whose distance from the sample is controlled by detecting the shear-fo rce drag on the laterally oscillating probe. The oscillatory motion of the probe is electromechanically excited and detected. Using this SCM, a set of images of topography, dC/dV, and dC/dX is simultaneously obtained, where C and V are, respectively, capacitance and applied voltage between the probe and the sample, and X is the coordinate along probe tip oscillation. The S CM developed shows sensitivity for dC/dV higher than the conventional SCM. The dC/dX image clearly indicates the built-in depletion region due to the p-n junction. (C) 2001 American Institute of Physics.