Development of thin-film metal hydrides for integration into field emission displays

Citation
Br. Chalamala et Rh. Reuss, Development of thin-film metal hydrides for integration into field emission displays, APPL PHYS L, 78(19), 2001, pp. 2967-2969
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
19
Year of publication
2001
Pages
2967 - 2969
Database
ISI
SICI code
0003-6951(20010507)78:19<2967:DOTMHF>2.0.ZU;2-1
Abstract
We report on the development of solid-state hydrogen sources utilizing thin -film metal hydrides. We demonstrate that integration of these metal hydrid e thin films facilitate a practical method to introduce controlled amounts of hydrogen into sealed field emission display assemblies. To prove the con cept, we operated Mo field emitter arrays without emission current loss for 400 h of continuous operation with titanium-hydride-coated stainless steel anode plates. Comparable arrays operated in the absence of hydride films, but in ultrahigh vacuum, had emission current degradation of over 50% in le ss than 100 h of operation. (C) 2001 American Institute of Physics.