The integration of active matrix polysilicon TFT technology with organic li
ght emitting diode (OLED) displays has been investigated with the goal of p
roducing displays of uniform brightness. This work identifies and addresses
several process integration issues unique to this type of display which ar
e important in achieving bright and uniform displays. Rapid thermal process
ing (RTP) has been incorporated to achieve uniform polysilicon microstructu
re, along with silicides to reduce parasitic source and drain series resist
ance. Using these processes, TFT drain current nonuniformity has been reduc
ed below 5% for 90% of the devices. This work also introduces transition me
tals to produce low resistance contacts to indium-tin-oxide (ITO) and to el
iminate hillock formation in the aluminum metallization, These processes, a
long with spin on glasses for planarization, have been used to produce func
tional active matrix arrays for OLED displays. The final array pixel perfor
mance is also presented.