Optical characteristics of silicon semiconductor bridges under high current density conditions

Citation
J. Kim et al., Optical characteristics of silicon semiconductor bridges under high current density conditions, IEEE DEVICE, 48(5), 2001, pp. 852-857
Citations number
10
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON ELECTRON DEVICES
ISSN journal
00189383 → ACNP
Volume
48
Issue
5
Year of publication
2001
Pages
852 - 857
Database
ISI
SICI code
0018-9383(200105)48:5<852:OCOSSB>2.0.ZU;2-H
Abstract
The optical emission spectra (180-700 nm) of plasma produced by a semicondu ctor bridge (SCB) with aluminum or tungsten electrodes have been measured a nd analyzed. The spatially and temporally resolved emission spectra of the SCB device have provided insights into the dynamic discharge of the bridge, The plasma electron temperature of the SCB device was measured using the c omparison of the continuum emission of the bridge with the calculated optic al emission spectra for a gray body source, Measured electron temperatures in the plasma produced by the bridges are related to the capacitor discharg ing voltage. The best estimates indicate that 4100-5500 degreesK was measur ed for Al-electrode SCB device and 5650-6000 degreesK for W-electrode SCB d evice.