A novel dual-polarity on-chip electrostatic discharge (F,SD) protection str
ucture is designed. The new ESD structure protects IC chips against ESD str
essing in the two opposite directions. The ESD structure features symmetric
deep-snapback current-voltage (I-V) characteristics, low-impedance active
overcurrent discharging path, low holding voltage for over-voltage clamping
, fast CSD response of similar to0.18 nS, low leakage (similar to pA), adju
stable triggering voltage, and good scalability, It passes 14 KV HEM ESD za
pping tests and achieves high ESD-performance-to-Si ratio of similar to 80
V/mum width, The new ESD structure reduces Si areas consumed by ESD protect
ion units and ESD-induced parasitic effects significantly.