Pulsed power technology and its applications at Extreme Energy-Density Research Institute (EDI), Nagaoka

Recent activities concerning pulsed power technology and its applications a re reviewed. Using high-density ablation plasma produced due to the short r ange of an ion beam in targets, we have successfully prepared crystallized B4C thin films by ion-beam evaporation, which are characterized by hardness , wear resistance, and stability at high temperatures. Fullerenes have been prepared as well. Ultrafine nanosize powders were synthesized by pulsed wi re discharge. Flue gas treatment of NOx was achieved by intense pulsed rela tivistic electron beam. Foil acceleration was observed to be similar to8 km /s at the ablation pressure of 13 GPa. Pulsed laser deposition was used to prepare (Cr1-xAlx)N films. The AIN solubility Limit was found to be 77 at.% AIN. The hardness of the films increases with x up to 0.75, and decreases rapidly due to their being amorphous in structure. A highly repetitive, new pulsed power generator is operational, with the specifications of 400 kV, 13 kA, 120 ns, and 1 pps.