K. Yatsui et al., Pulsed power technology and its applications at Extreme Energy-Density Research Institute (EDI), Nagaoka, JPN J A P 1, 40(2B), 2001, pp. 921-929
Recent activities concerning pulsed power technology and its applications a
re reviewed. Using high-density ablation plasma produced due to the short r
ange of an ion beam in targets, we have successfully prepared crystallized
B4C thin films by ion-beam evaporation, which are characterized by hardness
, wear resistance, and stability at high temperatures. Fullerenes have been
prepared as well. Ultrafine nanosize powders were synthesized by pulsed wi
re discharge. Flue gas treatment of NOx was achieved by intense pulsed rela
tivistic electron beam. Foil acceleration was observed to be similar to8 km
/s at the ablation pressure of 13 GPa. Pulsed laser deposition was used to
prepare (Cr1-xAlx)N films. The AIN solubility Limit was found to be 77 at.%
AIN. The hardness of the films increases with x up to 0.75, and decreases
rapidly due to their being amorphous in structure. A highly repetitive, new
pulsed power generator is operational, with the specifications of 400 kV,
13 kA, 120 ns, and 1 pps.