Formation and properties of carbon nitride thin films by pulsed Nd : YAG laser deposition

Citation
Y. Suda et al., Formation and properties of carbon nitride thin films by pulsed Nd : YAG laser deposition, JPN J A P 1, 40(2B), 2001, pp. 1061-1063
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Volume
40
Issue
2B
Year of publication
2001
Pages
1061 - 1063
Database
ISI
SICI code
Abstract
Carbon nitride thin films were synthesized on Si(100) substrates by pulsed Nd:YAG laser deposition. Several spectral lines originating from the neutra l and ionic species, such as carbon atoms, carbon ions, carbon molecules an d carbon nitride molecules were identified in the plasma plume. The surface morphology of the carbon nitride thin films reveals numerous droplets on t he films out of which several are spiral shaped. The NIC composition ratio is increased from 0.18 to 0.25 with increasing substrate bias voltage. Four ier transform infrared spectroscope absorption spectra show two characteris tic bands: a broad band composed of the graphite G-band and disordered D-ba nd of carbon, and another associated with the CN triple bond. Raman spectra have also been used to characterize the films.