We have investigated the effect of Zn co-doping in metal-organic vapor-phas
e epitaxy (MOVPE) growth of highly carbon doped In0.53Ga0.47As/InP layers u
sing nitrogen carrier gas. A Zn concentration of 3 x 10(18) cm(-3) for a C
concentration of 1.8 x 10(19) cm(-3) leads to a significantly increased min
ority carrier lifetime, and also to slightly improved majority carrier char
acteristics. At this concentration the Zn diffusion is not crucial, and thi
s technique may have important applications for InP based hetero bipolar tr
ansistors (HBTs).