Catalytic synthesis of straight silicon nanowires over Fe containing silica gel substrates by chemical vapor deposition

Citation
Zq. Liu et al., Catalytic synthesis of straight silicon nanowires over Fe containing silica gel substrates by chemical vapor deposition, J CRYST GR, 224(3-4), 2001, pp. 230-234
Citations number
15
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
224
Issue
3-4
Year of publication
2001
Pages
230 - 234
Database
ISI
SICI code
0022-0248(200104)224:3-4<230:CSOSSN>2.0.ZU;2-J
Abstract
We report a new method to synthesize very straight silicon nanowires using a porous iron/SiO2 gel as a template by thermal chemical vapor deposition a t a temperature of about 500 degreesC. Scanning electron microscopy, transm ission electron microscopy and Raman scattering spectroscopy were used to c haracterize the samples. The results show that a large amount of straight S i nanowires with diameters of about 30 nm and lengths of about 1 mum was ob tained. High-resolution transmission electron microscopy observation shows that microtwin defects lie in the straight silicon nanowires. Raman scatter ing from the nanowires shows a larger line width (about 15 cm(-1)) and a do wn-shifted (about 9 cm(-1)) peak as compared to that of bulk crystalline si licon. (C) 2001 Elsevier Science B.V. All rights reserved.