Optimum conditions for photoresponse of azobenzene-organophilic tetrasilicic mica complexes

Citation
T. Fujita et al., Optimum conditions for photoresponse of azobenzene-organophilic tetrasilicic mica complexes, MATER RES B, 36(3-4), 2001, pp. 557-571
Citations number
22
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS RESEARCH BULLETIN
ISSN journal
00255408 → ACNP
Volume
36
Issue
3-4
Year of publication
2001
Pages
557 - 571
Database
ISI
SICI code
0025-5408(200102/03)36:3-4<557:OCFPOA>2.0.ZU;2-7
Abstract
To determine optimum conditions for large photoresponses, the alkyl chain l ength and the concentration of trimethyl-alkylammonium (TMAA) were varied t o prepare 16 o-TSM hosts for organophilic fluor-tetrasilicic mica (o-TSM) I azobenzene (AzBz) complexes. Photoresponses for AzBz/o-TSM complexes prepa red by vapor-phase intercalation of AzBz into o-TSM were monitored by chang es in d(001) under UV irradiation (lambda = 365 nm). A large photoresponse, a 0.2-0.5 nm decrease in d(001), was observed for the complexes with o-TSM hosts having a pseudo-trimolecular structure with 2.2-2.5 nm basal spacing . The complexes with less or no photoresponse were derived from o-TSM with bimolecular and paraffin-type structures. These results indicate that photo responsiveness is closely related to the structure of the o-TSM hosts, and that pseudo-trimolecular-structure o-TSM can provide complexes with good ph otoresponsive properties. (C) 2001 Elsevier Science Ltd. All rights reserve d.