The metallization of diamond by ion beam assisted deposition (IBAD) and sub
sequent sputter deposition was investigated. IBAD was adopted to prepare th
ree metallization schemes for diamond substrates, i.e., Ti/Ni, Ti/Cr and T/
W. A AuSn solder layer was deposited onto these systems using a sputtering
technique. Metallization samples were subsequently furnace annealed. Charac
terization of the multi-layered films was performed using Rutherford backsc
attering spectrometry. The results showed that the diamond/Ti/Ni/AuSn and d
iamond/Ti/W/AuSn systems exhibit poorer thermal stability owing to Sn from
AuSn solder reacting with the barrier metal during annealing. However, the
diamond/Ti/Cr/AuSn structure appeared to be stable during annealing. (C) 20
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