In situ interface characterization of silicon surface in fluoride media

Citation
Bk. Patel et Sn. Sahu, In situ interface characterization of silicon surface in fluoride media, MAT SCI E A, 304, 2001, pp. 914-917
Citations number
29
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
ISSN journal
09215093 → ACNP
Volume
304
Year of publication
2001
Pages
914 - 917
Database
ISI
SICI code
0921-5093(20010531)304:<914:ISICOS>2.0.ZU;2-T
Abstract
The porous Si/HF-electrolyte junction has been studied by: capacitance (C)- voltage (V) and current (I)-voltage (V) measurements. The observed current under forward bias shows an exponential increase like a Schottky diode with two oscillations around 1.0 and 2.4 V (SCE!, respectively, whereas the rev erse bias current shows negligible contribution. The low-frequency capacita nce spectrum exhibits a peak structure in forward bias regime, which can be ascribed to the charge trapping/detrapping at Fermi level of porous Si und er forward bias. The potential and charge distribution for a p-semiconducto r/electrolyte junction is discussed (C) 2001 Elsevier Science B.V. All righ ts reserved.