Photoluminescence of erbium doped microcrystalline silicon thin films produced by reactive magnetron sputtering

Citation
Hf. Cerqueira et al., Photoluminescence of erbium doped microcrystalline silicon thin films produced by reactive magnetron sputtering, MAT SCI E B, 81(1-3), 2001, pp. 32-35
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
81
Issue
1-3
Year of publication
2001
Pages
32 - 35
Database
ISI
SICI code
0921-5107(20010424)81:1-3<32:POEDMS>2.0.ZU;2-4
Abstract
Microcrystalline silicon thin films doped with erbium were produced by RF s puttering and their structural, chemical and optical properties were studie d by X-ray diffractometry at grazing incidence, Rutherford back scattering (RBS) and optical transmission spectroscopy. The samples exhibit a sharp ph otoluminescence (PL) spectrum from the Er centres with the strongest peak p ositioned at 1.536 mum with a full width at half maximum of about 8 nm. Whe n the temperature varies between 5 and 300 K, the photoluminescence decreas es only 5-fold, in contrast to the behaviour reported for monocrystalline s ilicon. (C) 2001 Elsevier Science B.V. All rights reserved.