Site selective excitation of Er-implanted GaN

Citation
H. Przybylinska et al., Site selective excitation of Er-implanted GaN, MAT SCI E B, 81(1-3), 2001, pp. 147-149
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY
ISSN journal
09215107 → ACNP
Volume
81
Issue
1-3
Year of publication
2001
Pages
147 - 149
Database
ISI
SICI code
0921-5107(20010424)81:1-3<147:SSEOEG>2.0.ZU;2-6
Abstract
The photoluminescence (PL), and PL excitation studies of Er-implanted GaN r eveal a variety of Er centers with different excitation mechanisms. The PL of the centers dominating under above band-gap illumination is mediated pri marily by donor-acceptor pair recombination, and subject to temperature que nching. Evidence is found for significant energy migration among Er centers dominating under direct excitation into the 4f-shell, which leads to a str onger quenching. The PL intensity of centers excited by a broad, below-gap absorption band, associated with deep traps is temperature independent. (C) 2001 Elsevier Science B.V. All rights reserved.