Hg. Jung et al., An Al plus Y coating process for improvement of the high-temperature oxidation resistance of a TiAl alloy, OXID METAL, 55(3-4), 2001, pp. 189-208
An Al + Y codeposition by a single EB-PVD process has been developed to imp
rove the high-temperature oxidation resistance of a TiAl alloy. The Al + Y
codeposited TiAl alloy with various ratios of Al and Y evaporation sources
was evaluated by isothermal and cyclic-oxidation tests. The coating layer h
as a composition gradient because of the difference in vapor pressure betwe
en Y and Al. The oxidation resistance can be extensively improved by the fo
rmation of an Al + Y codeposition layer and it depends on the ratio of the
source material of Al and Y. The best oxidation resistance was obtained fro
m the Al + Y codeposited TiAl alloy with a ratio of Al:2Y. With the proper
ratio of Al. Y, the Al + Y codeposition coating forms Two layers of the oxi
des during high-temperature oxidation + the outer (Y, Al) O layer and the i
nner Al2O3 layer, containing small amounts of Y oxide. These oxide layers,
which have a fine grain size, act as a diffusion barrier, thus suppressing
the rate of inward diffusion of O and may readily relieve thermal stresses.