Correlation between hardness and structure of carbon-nitride thin films obtained by reactive pulsed laser deposition

Authors
Gyorgy, E Nelea, V Mihailescu, IN Perrone, A Pelletier, H Cornet, A Ganatsios, S Werckmann, J
Citation
E. Gyorgy et al., Correlation between hardness and structure of carbon-nitride thin films obtained by reactive pulsed laser deposition, THIN SOL FI, 388(1-2), 2001, pp. 93-100
Citations number
35
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
388
Issue
1-2
Year of publication
2001
Pages
93 - 100
Database
ISI
SICI code
0040-6090(20010601)388:1-2<93:CBHASO>2.0.ZU;2-B
Abstract
Carbon-nitride thin films were synthesized by reactive pulsed laser deposit ion from graphite targets in low-pressure nitrogen. X-Ray photoelectron spe ctroscopy and nanoindentation measurements were performed in order to estab lish a connection between the composition, structure and hardness of the ob tained thin films. We studied the variation of the sp(3)/sp(2) C bonded to N ratio with the increase of the N content of the thin layers. We found tha t the value of this ratio mainly determines the hardness of the carbon-nitr ide layers. The stability in time and/or under thermal heating of the CN bo nds formed was also tested. (C) 2001 Published by Elsevier Science B.V. All rights reserved.