Determination of oscillator strength of C-F vibrations in fluorinated amorphous-carbon films by infrared spectroscopy

Authors
Wang, X Harris, H Temkin, H Gangopadhyay, S Strathman, MD West, M
Citation
X. Wang et al., Determination of oscillator strength of C-F vibrations in fluorinated amorphous-carbon films by infrared spectroscopy, APPL PHYS L, 78(20), 2001, pp. 3079-3081
Citations number
6
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
20
Year of publication
2001
Pages
3079 - 3081
Database
ISI
SICI code
0003-6951(20010514)78:20<3079:DOOSOC>2.0.ZU;2-P
Abstract
Fluorinated amorphous-carbon (a-CFx) films deposited by plasma-enhanced che mical-vapor deposition were investigated by Fourier transform infrared tran smission spectroscopy and Rutherford backscattering. The proportionality co nstant between the fluorine concentration and the integrated absorption of C-F vibration modes is 3.52 +/-0.3 x 10(19) cm(-2), and is constant within experimental uncertainty over a wide range of processing conditions. It is shown that the fluorine content can be accurately determined from the infra red absorption spectrum of a-CFx films. (C) 2001 American Institute of Phys ics.