Electronic structure and compositional interdiffusion in self-assembled Gequantum dots on Si(001)

Authors
Citation
Jh. Seok et Jy. Kim, Electronic structure and compositional interdiffusion in self-assembled Gequantum dots on Si(001), APPL PHYS L, 78(20), 2001, pp. 3124-3126
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
78
Issue
20
Year of publication
2001
Pages
3124 - 3126
Database
ISI
SICI code
0003-6951(20010514)78:20<3124:ESACII>2.0.ZU;2-7
Abstract
The radiative recombination peaks over a broad energy range of 0.75-0.9 eV have been observed by photoluminescence spectroscopy in self-assembled Ge/S i quantum dot structures. In order to clarify the broadness of the peak dis tribution, we have investigated the electronic structure of an approximate model by taking the profiles of strain components at atomic positions into account. The three-dimensionally confined levels are then obtained by diago nalizing the Hamiltonian matrix of the Schrodinger equation based on strain -modified potential. Theoretical results compared with the observed recombi nation energies verify that significant interdiffusion between a Si capping layer and a Ge dot takes place. This is also consistent with recently repo rted experimental results. (C) 2001 American Institute of Physics.