Jh. Seok et Jy. Kim, Electronic structure and compositional interdiffusion in self-assembled Gequantum dots on Si(001), APPL PHYS L, 78(20), 2001, pp. 3124-3126
The radiative recombination peaks over a broad energy range of 0.75-0.9 eV
have been observed by photoluminescence spectroscopy in self-assembled Ge/S
i quantum dot structures. In order to clarify the broadness of the peak dis
tribution, we have investigated the electronic structure of an approximate
model by taking the profiles of strain components at atomic positions into
account. The three-dimensionally confined levels are then obtained by diago
nalizing the Hamiltonian matrix of the Schrodinger equation based on strain
-modified potential. Theoretical results compared with the observed recombi
nation energies verify that significant interdiffusion between a Si capping
layer and a Ge dot takes place. This is also consistent with recently repo
rted experimental results. (C) 2001 American Institute of Physics.