Novel synthesis of ClF6+ and BrF6+ salts

Citation
T. Schroer et Ko. Christe, Novel synthesis of ClF6+ and BrF6+ salts, INORG CHEM, 40(10), 2001, pp. 2415-2419
Citations number
39
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
INORGANIC CHEMISTRY
ISSN journal
00201669 → ACNP
Volume
40
Issue
10
Year of publication
2001
Pages
2415 - 2419
Database
ISI
SICI code
0020-1669(20010507)40:10<2415:NSOCAB>2.0.ZU;2-2
Abstract
For a compound in a given oxidation state, its oxidizing strength increases from its anion to the neutral parent molecule to its cation. Similarly, an anion is more easily oxidized than its neutral parent molecule, which in t urn is more easily oxidized than its cation. This concept was systematicall y exploited in our search for new superoxidizers. Transition metal fluoride anions were prepared in their highest known oxidation states by high tempe rature/high pressure fluorinations with elemental fluorine and subsequently converted to their more strongly oxidizing cations by a displacement react ion with a strong Lewis acid. The application of this principle resulted in new syntheses for ClF6+AsF6- and BrF6+AsF6- using the highly reactive and thermally unstable NiF3+ cation that was prepared from the reaction of the NiF62- anion with AsF5 in anhydrous HF. Attempts to prepare the known KrFand ClO2F2+ cations and the yet unknown XeF7+ cation by the same method wer e unsuccessful. The results from this and previous studies show that NiF3is a stronger oxidative fluorinator than PtF6, but whether its oxidizing st rength exceeds that of KrF+ remains unclear. Its failure to oxidize Kr to K rF+ might have been due to unfavorable reaction conditions. Its failure to oxidize ClO2F to ClO2F2+, in spite of its favorable oxidizer strength, is a ttributed to the high Lewis basicity of ClO2F which results in a rapid disp lacement reaction of NiF3+ by ClO2F, thus generating the weaker oxidizer Ni F4 and the more difficult to oxidize substrate ClO2+. Therefore, the genera l applicability of this approach appears to be limited to substrates that e xhibit a weaker Lewis basicity than the neutral transition metal parent mol ecule. Compared to KrF+- or PtF6-based oxidations, the NiF3+ system offers the advantages of commercially available starting materials and higher yiel ds, but product purification can be more difficult and tedious than for KrF +.