Thermal stability of alpha ''-Fe16N2 thin films prepared by facing-target sputtering

Authors
Xu, YH Jiang, EY Wang, Y Hou, DL Ren, SW Bai, HL
Citation
Yh. Xu et al., Thermal stability of alpha ''-Fe16N2 thin films prepared by facing-target sputtering, PHYS ST S-A, 184(2), 2001, pp. 297-302
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH
ISSN journal
00318965 → ACNP
Volume
184
Issue
2
Year of publication
2001
Pages
297 - 302
Database
ISI
SICI code
0031-8965(20010416)184:2<297:TSOA'T>2.0.ZU;2-U
Abstract
(alpha)" -Fe16N2 thin films have been prepared by facing-target sputtering. Their structures, magnetic properties and thermal stability were studied b y X-ray diffraction (XRD), transmission electron microscope (TEM) and vibra ting sample magnetometer (VSM). It was found that the saturation magnetizat ion (M-s) of alpha " -Fe16N2 decreases with increasing temperature, and at about 523 K, a sudden change was observed, which can be attributed to the d ecomposition of alpha " -Fe16N2 into alpha -Fe and gamma ' -Fe4N.