Characterization of large area filtered are deposition technology: part I - plasma processing parameters

The transmission of metal-gas plasma flow generated by large area, rectangu lar dual-filtered-are source is investigated. The characteristic parameters of plasma flow such as ion current yield and inter-electrode voltage drop vs, gas pressure, are established for the deposition of TiN coatings. The u niformity and productivity of coating deposition on complex parts in a 3D o perational volume is determined. It is found that ion current yield increas es from 6 to 10 A with increasing argon pressure in the range of 2-7 x 10(- 2) Pa. It results in a deposition rate on the order 1-2 mum/h in a double r otation mode. It is shown that a thickness uniformity of +/- 10% or better can be achieved in a programmable, vertical scanning mode. (C) 2001 Elsevie r Science B.V. All rights reserved.