Novel positive-tone chemically amplified resists with photoacid generator in the polymer chains

Authors
Wu, HP Gonsalves, KE
Citation
Hp. Wu et Ke. Gonsalves, Novel positive-tone chemically amplified resists with photoacid generator in the polymer chains, ADVAN MATER, 13(9), 2001, pp. 670-672
Citations number
9
Categorie Soggetti
Multidisciplinary,"Material Science & Engineering
Journal title
ADVANCED MATERIALS
ISSN journal
09359648 → ACNP
Volume
13
Issue
9
Year of publication
2001
Pages
670 - 672
Database
ISI
SICI code
0935-9648(20010503)13:9<670:NPCARW>2.0.ZU;2-3