Direct three-dimensional patterning using nanoimprint lithography

We demonstrated that nanoimprint lithography (NIL) can create three-dimensi onal patterns, sub-40 nm T-gates, and air-bridge structures, in a single st ep imprint in polymer and metal by lift-off. A method based on electron bea m lithography and reactive ion etching was developed to fabricate NIL molds with three-dimensional protrusions. The low-cost and high-throughput nanoi mprint lithography for three-dimensional nanostructures has many significan t applications such as monolithic microwave integrated circuits and nanoele ctromechanical system. (C) 2001 American Institute of Physics.