D. Stapel et A. Benninghoven, Application of atomic and molecular primary ions for TOF-SIMS analysis of additive containing polymer surfaces, APPL SURF S, 174(3-4), 2001, pp. 261-270
The influence of primary ion mass and composition on secondary ion emission
of the additive Irganox 1010 (m = 1176 u) in polyethylene was investigated
. O+, Ar+, Xe+, O-2(+), CO2+, SF5+, C7H7+, C10H8+, C6F6+, and C10F8+ with a
total energy of 11 keV were used as primary ions under static secondary io
n mass spectrometry (SIMS) conditions. Positive and negative molecular seco
ndary ions characterizing the additive were determined and their yields wer
e evaluated.
For all characteristic secondary ions we found a strong yield enhancement w
ith increasing mass for atomic primary ions and increasing number of consti
tuents for molecular primary ions. This yield enhancement is saturated once
the molecular primary ion is made of more than six heavy atoms. In additio
n this yield increase depends on the mass and structure of the considered s
econdary ion. We did not find any evidence for an influence of the chemical
composition of the applied molecular primary ions on the secondary ion emi
ssion when static SIMS conditions were met. The improved imaging capabiliti
es of molecular primary ions was demonstrated by comparing focused Ar+ and
SF5+ primary ion beams when mapping characteristic secondary ion emission f
rom a structured additive containing polypropylene surface. (C) 2001 Publis
hed by Elsevier Science B.V.