Diamond film growth in an oxygen atmosphere

Citation
M. Yoshimoto et al., Diamond film growth in an oxygen atmosphere, DIAM RELAT, 10(3-7), 2001, pp. 295-299
Citations number
18
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
10
Issue
3-7
Year of publication
2001
Pages
295 - 299
Database
ISI
SICI code
0925-9635(200103/07)10:3-7<295:DFGIAO>2.0.ZU;2-E
Abstract
We propose a new method for the synthesis of diamond films via a hydrogen-f ree vapor-phase route of pulsed laser ablation of a graphite target in a lo w-pressure pure oxygen atmosphere. The evidence from microscopic, diffracti on and spectroscopic techniques indicates that high-quality diamond crystal s can be nucleated and grown epitaxially on sapphire (single-crystal alumin um oxide) substrates without diamond-powder treatment at temperatures lower than 600 degreesC under the optimized growth conditions of oxygen pressure and pulsed KrF-excimer laser ablation. The spectroscopic property of a las er plasma plume produced during pulsed laser ablation of graphite in an oxy gen atmosphere was examined by using time-resolved optical emission measure ments in order to discuss the vapor-phase reaction and film growth mechanis m. (C) 2001 Elsevier Science B.V. All rights reserved.