On the mechanism of CH3 radical formation in hot filament activated CH4/H-2 and C2H2/H-2 gas mixtures

Resonance enhanced multiphoton ionization spectroscopy has been used to det ermine relative number densities of CH, radicals in a hot filament chemical vapour deposition (KF-CVD) reactor designed for diamond growth, as a funct ion of process gas (ie. both CH4/H-2 and C2H2/H-2 gas mixtures), position ( d), filament temperature (T-f) and local gas temperature (T-g). The similar CW, radical number density profiles observed upon activation of the two fe edstock gas mixtures suggest that CH, radical formation in both cases is do minated by gas phase chemistry, in contradiction of the current consensus w hich invokes surface catalysed hydrogenation as the means of inducing the n ecessary C-C bond fission in the case of C2H2/H-2 gas mixtures. Three bud; addition reactions involving C2H2 (and C2H4), together with H atoms and H-2 molecules, are identified as probable reactions requiring further study in order to provide a proper description of diamond CVD using a C2H2/H-2 gas feed. (C) 2001 Elsevier Science B.V. All rights reserved.