Jk. Lee et al., Properties of diamond films deposited by multi-cathode direct current plasma assisted CVD method, DIAM RELAT, 10(3-7), 2001, pp. 552-556
Four diamond films were prepared by the multi-cathode direct current plasma
-assisted chemical vapor deposition (DC-PACVD) method and optical and therm
al properties were characterized. Optical transmission and thermal conducti
vity were strongly dependent on the power density and the methane concentra
tion. Impurities such as, H, Na, Al, Si, K, Ca and Ta were detected by SIMS
analysis. The Ta concentration in diamond films was found to be around 300
ppm by RES measurement and Ta inclusion originated from the Ta cathode kep
t above 2100 degreesC. Optical and thermal properties of the diamond film d
eposited with a growth rate of 4 mum/h at 0.37 kW/cm(2) (17 kW on phi 76 mm
substrate) and 5% CH4 were similar to that of the type IIa natural diamond
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