Electrical conduction in nanostructured carbon films produced by supersonic cluster beam deposition

Citation
M. Bruzzi et al., Electrical conduction in nanostructured carbon films produced by supersonic cluster beam deposition, DIAM RELAT, 10(3-7), 2001, pp. 989-992
Citations number
11
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
10
Issue
3-7
Year of publication
2001
Pages
989 - 992
Database
ISI
SICI code
0925-9635(200103/07)10:3-7<989:ECINCF>2.0.ZU;2-M
Abstract
We present a study on electrical conduction in nanostructured carbon films produced by deposition of a supersonic beam of neutral carbon clusters. The electrical transport properties have been investigated by measuring the el ectrical conductance both in-situ, during the film deposition, and ex-situ, after the film exposure to ambient air. The I-V characteristic indicates a strict ohmic behavior all over the measured electric field range up to (2 kV/cm). Changes in the electrical conductance have been observed due to gas adsorption-desorption mechanisms. The exposure to air leads to a passivati on of the film with an increase of resistivity up to similar to 0.1 G Omega .cm. Current-temperature characteristics measured in vacuum in the tempera ture range 150-400 K, both in-situ and ex-situ, indicate a thermally activa ted conductivity with energy of similar to0.3 eV. (C) 2001 Elsevier Science B.V. ALL rights reserved.