Hydrogenation of 6H-SiC as a surface passivation stable in air

Citation
N. Sieber et al., Hydrogenation of 6H-SiC as a surface passivation stable in air, DIAM RELAT, 10(3-7), 2001, pp. 1291-1294
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
DIAMOND AND RELATED MATERIALS
ISSN journal
09259635 → ACNP
Volume
10
Issue
3-7
Year of publication
2001
Pages
1291 - 1294
Database
ISI
SICI code
0925-9635(200103/07)10:3-7<1291:HO6AAS>2.0.ZU;2-3
Abstract
We have terminated the hexagonal (0001) and (000 (1) over bar) surfaces of 6H-SiC with a monolayer of hydrogen by exposing the SiC crystal to pure hyd rogen at elevated temperatures. The surfaces exhibit sharp, background-free , and unreconstructed LEED patterns and the photoemission spectra show only bulk-related Si and C components and give no indication of additional unwa nted adsorbates. On the Si-terminated (0001) surface, a sharp doublet at 21 30 cm(-1) with a splitting of 6 cm(-1) is observed in surface-sensitive inf rared spectroscopy, which is due to monohydride Si-H stretching modes. The origin of the splitting is discussed. The hydrogenated surfaces are passiva ted chemically and electronically. The oxygen uptake is less than 2 at.% af ter 2 h air exposure without any sign of Si-O or C-O bond formation. The su rface Fermi level is unpinned and exhibits its bulk position on n- and p-ty pe samples. (C) 2001 Elsevier Science B.V. All rights reserved.