Low-frequency glow discharge deposition of a silicon dioxide film onto thesurface of glass microspheres

Laser fusion research demands microsized hollow shells with a large diamete r and a thick wall. Because these geometric parameters are difficult to pro vide by fabrication, the wall thickness was increased by deposition of a si licon dioxide film on the outer surface of glass microspheres. The film was obtained by decomposition of tetraethoxysilane vapor in a low-frequency di scharge plasma in mixtures with argon and oxygen. The thickness of coating was shown to be a linear function of the deposition lime and the consumptio n of the precursor organoelement compound. The composition of plasma-deposi ted layers was studied and their density and refractive index were determin ed. Elemental analysis data showed that the coating comprised silicon dioxi de with carbon and hydrogen impurities.