SIMULATION OF PULSE-HEIGHT SPECTRA IN ION-BEAM-INDUCED CHARGE MICROSCOPY OF POLYCRYSTALLINE SILICON

Citation
C. Donolato et R. Nipoti, SIMULATION OF PULSE-HEIGHT SPECTRA IN ION-BEAM-INDUCED CHARGE MICROSCOPY OF POLYCRYSTALLINE SILICON, Journal of applied physics, 82(2), 1997, pp. 742-747
Citations number
23
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
82
Issue
2
Year of publication
1997
Pages
742 - 747
Database
ISI
SICI code
0021-8979(1997)82:2<742:SOPSII>2.0.ZU;2-G
Abstract
This article describes computer simulations of the charge pulse height spectra that are obtained by irradiating selected regions of a polycr ystalline silicon solar cell by a 2 MeV He+ microbeam. The spectra are calculated in terms of the energy loss function of the ions and the d istribution of the charge collection probability at a grain boundary, and illustrate the effect of the interface recombination velocity of t he grain boundary and the bulk diffusion length. The simulations are c ompared with some experimental spectra to demonstrate the applicabilit y of the theory. The method can be extended to the analysis of other s emiconductor defects or more complex devices. (C) 1997 American Instit ute of Physics.