C. Donolato et R. Nipoti, SIMULATION OF PULSE-HEIGHT SPECTRA IN ION-BEAM-INDUCED CHARGE MICROSCOPY OF POLYCRYSTALLINE SILICON, Journal of applied physics, 82(2), 1997, pp. 742-747
This article describes computer simulations of the charge pulse height
spectra that are obtained by irradiating selected regions of a polycr
ystalline silicon solar cell by a 2 MeV He+ microbeam. The spectra are
calculated in terms of the energy loss function of the ions and the d
istribution of the charge collection probability at a grain boundary,
and illustrate the effect of the interface recombination velocity of t
he grain boundary and the bulk diffusion length. The simulations are c
ompared with some experimental spectra to demonstrate the applicabilit
y of the theory. The method can be extended to the analysis of other s
emiconductor defects or more complex devices. (C) 1997 American Instit
ute of Physics.