RC delay metrics for performance optimization

Citation
Cj. Alpert et al., RC delay metrics for performance optimization, IEEE COMP A, 20(5), 2001, pp. 571-582
Citations number
24
Categorie Soggetti
Eletrical & Eletronics Engineeing
Journal title
IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS
ISSN journal
02780070 → ACNP
Volume
20
Issue
5
Year of publication
2001
Pages
571 - 582
Database
ISI
SICI code
0278-0070(200105)20:5<571:RDMFPO>2.0.ZU;2-F
Abstract
For performance optimization tasks such as floorplanning, placement, buffer insertion, wire sizing, and global routing, the Elmore resistance-capacita nce (RC? delay metric remains popular due to its simple closed form express ion, fast computation speed, and fidelity with respect to simulation. More accurate delay computation methods are typically central processing unit in tensive and/or difficult to implement. To bridge this gap between accuracy and efficiency/simplicity, we propose two new RC delay metrics called delay via two moments (D2M) and effective capacitance metric (ECM), which are vi rtually as simple and fast as the Elmore metric, but more accurate. D2M use s two moments of the impulse response in a simple formula that has high acc uracy at the far end of RC lines. ECM captures resistive shielding effects by modeling the downstream capacitance by an "effective capacitance." In co ntrast, the Elmore metric models this as a lumped capacitance, thereby igno ring resistive shielding. Although not as accurate as D2M, ECM yields consi stent performance and may be well-suited to optimization due to its Elmore- like recursive construction.