Plasma development during picosecond laser processing of electronic materials

Authors
Mao, SS Greif, R Mao, XL Russo, RE
Citation
Ss. Mao et al., Plasma development during picosecond laser processing of electronic materials, J HEAT TRAN, 122(3), 2000, pp. 424-424
Categorie Soggetti
Mechanical Engineering
Journal title
JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME
ISSN journal
00221481 → ACNP
Volume
122
Issue
3
Year of publication
2000
Pages
424 - 424
Database
ISI
SICI code
0022-1481(200008)122:3<424:PDDPLP>2.0.ZU;2-6