T. Ackemann et al., Polarization degrees of freedom in optical pattern forming systems: alkalimetal vapour in a single-mirror arrangement, J OPT B-QUA, 3(2), 2001, pp. S124-S132
The use of polarization degrees of freedom in optimizing the conditions for
optical pattern formation is investigated by discussing the particular exa
mple of single-mirror feedback systems. It is demonstrated that in a quasi-
scalar saturable medium pattern formation may be completely suppressed by t
he interplay of saturation and diffusion. This effect takes place for the o
ptical pumping nonlinearity between Zeeman ground states in alkaline vapour
cells. It is shown that these limitations can be circumvented by introduci
ng additional polarization components either in the input beam or in the fe
edback beam. The latter is achieved by introducing polarization-changing el
ements such as a quarter-wave plate in the feedback loop. In the optimized
scheme, pattern formation is obtained with rather low thresholds. Thus, inv
estigations with a rather high aspect ratio and far beyond threshold become
feasible.